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Isolast® PureFab™ JPF10
Fully organic material for demanding high temperature semiconductor applications. Low particle generation and excellent outgassing performance leads to increased process yields and lower total cost of ownership of semiconductor processes.
Isolast® PureFab™ JPF20
A new level of plasma resistance for the most aggressive semiconductor applications
Isolast® PureFab™ JPF21
Outstanding high temperature performance in challenging semiconductor applications. Excellent oxygen plasma resistance, minimum particulation in NF3 plasma and dimensional stability at elevated temperatures.
Isolast® PureFab™ JPF30
Leading edge translucent material for critical semiconductor applications